Previously, we discussed the effect of doping concentrations on the energy band gap. The conclusion of this process was that the doping concentration alone does not alter the band gap. The band gap is the difference between the conduction band and valence bands. Under biasing, the conduction and valence bands are in fact affected by doping concentration.
One method to explain how the doping level will influence the conduction band and valence band under bias is by demonstrating the difference between the energy bands of a PN Junction versus that of a PIN Junction. Simulations of both are presented below. The intermediate section found between the p-doped and n-doped regions of the PIN junction diode offer a more gradual transition between the two levels. A PN junction offers a sharper transition at the conduction and valence band levels simulatenously. A heterostructure, which is made of more than one material (which will have different band gaps) may produce even greater discontinuities. Depending on the application, a discontinuity may be sought (think, Quantum well), while in other situations, it may be necessary to smooth the transition between band levels for a desired result.
The conduction and valence bands are of great importance for determining the carrier concentrations and carrier mobilities in a semiconductor structure. These will be discussed soon.
PN Junction under biasing (conduction and valence band energies):
Code Used (PN Junction):
#TOP TO BOTTOM – Structure Specification
region num=1 bottom thick = 0.5 material = GaAs NY = 20 acceptor = 1e18
region num=2 bottom thick = 0.5 material = GaAs NY = 20 donor = 1e18
PIN Junction Biased:
PIN Junction Unbiased:
Code Used (PIN Junction):
#TOP TO BOTTOM – Structure Specification
region num=1 bottom thick = 0.5 material = GaAs NY = 20 acceptor = 1e18
region num=3 bottom thick = 0.2 material = GaAs NY = 10
region num=2 bottom thick = 0.5 material = GaAs NY = 20 donor = 1e18
Here, the carrier concentrations are plotted: